Pulsed Laser Deposition (PLD) Machine
The device adopts the thin film deposition technology of pulsed laser coating (PLD), to make rapid evaporation of the target material by pulsed laser to deposit the thin film of same composition as target material. By continuously dissolving the mixed target materials, the multi-layers of films of different substances can be produced,and the thickness of the deposited films can be precisely adjusted or controlled to the single atomic layer through the control of pulse numbers.
The PLD method can obtain the artificially synthesized new materials of composition and structure of the quasi-steady state composition and structure thermo-dynamically, available to make ceramic oxide, nitride films, metallic multi-layers and various superlattices.
Film form principle:
The PLD method is to make pulsed laser introduced into a vacuum chamber through a synthetic quartz window irradiating onto a film-forming target material. Under the irradiation of pulsed laser the target material absorbs high density energy to form a plume-like plasma state and then deposit on the substrates. Thus the thin films are deposied.
► A laser beam can be used for several vacuum systems with economical cost.
► High-quality samples can be formed within 10~15 minutes with deposition of high-efficiency.
► As a "digital" technology, the technical process can be controlled and performed at the nanometer scale.
► The deposited film remains the stoichiometric composition of target material and forms the same chemical composition as the target material.
► By controlling the coating pressure and temperature, a series of nanostructures and nanoparticles with unique functions can be synthesized.
► Energy source (pulsed laser) is located outside the vacuum chamber. When the material is synthesized, the dynamic range of the working pressure is very wide, reaching 10-10 Torr to 100 Torr.
China Guangdong PVD Metallizer Co.
Mobile: +86 13929890858